1500℃ Vacuum tube furnace with corundum tubes or silicon carbide furnace tubes

The vacuum tube furnace heated by silicon carbon rods typically features a double-shell structure with a cooling system to ensure the safety of operators and the stable operation of the equipment. The furnace lining is made of high-purity alumina microcrystalline fiber material, coated with a high-temperature alumina coating to enhance reflectivity and heating efficiency, while extending the service life of the equipment. The furnace tube generally uses high-purity corundum tubes or silicon carbide furnace tubes to ensure stability and corrosion resistance at high temperatures.

Equipment Features:

High-Temperature Performance: The equipment has a maximum operating temperature of 1500°C, suitable for high-temperature sintering, annealing, and heat treatment.

Heating Elements: Silicon carbon rods are used as heating elements, providing a uniform temperature field and a long service life.

Temperature Control System: Equipped with PID automatic control and self-tuning functions, the temperature control accuracy is as high as ±1°C, ensuring the precision of experiments.

Vacuum System: Equipped with mechanical and molecular pumps, suitable for material processing that requires a high vacuum environment.

Safety Design: It has over-temperature protection, breakaway protection, to ensure safe operation.

Contact info:

Email:jason@cysitech.com

WhatsApp: +86 150 3827 0566

Wechat/Phone: +86 136 6380 8508

Parameters:

Application Areas:

Due to its high temperature, high vacuum characteristics, the vacuum tube furnace is widely used in various fields:

Material Science: Used for the synthesis of new materials, metallurgy, glass, sublimation, and other processes.

Semiconductor Industry: A key piece of equipment in the cleaning, oxidation, and diffusion processes of silicon wafers.

Energy Research: Used in the development of battery materials and the preparation of biosensors.

Powder Metallurgy: Used for the sintering of metal powders to produce high-strength components.

Chemical Vapor Deposition (CVD): Film deposition under vacuum conditions is applied in the preparation of semiconductor and optoelectronic materials.

In summary, the silicon carbon rod heated vacuum tube furnace plays an important role in modern material research and industrial production with its high-temperature performance, precise temperature control system, high vacuum environment, and a wide range of application areas.