Slide annealing furnace is an efficient and accurate material heating and annealing equipment, which is widely used in the processing and manufacturing of metal materials. Mainly used in college laboratories, industrial and mining enterprise laboratories, used in high, medium and low temperature CVD process, such as the development of carbon nanotubes, crystal silicon substrate coating, metal material diffusion welding and vacuum or atmosphere heat treatment;
Annealing furnace tube is installed at both ends of the vacuum flange, vacuum degree with molecular pump can be 10-5Torr, mechanical pump can be 10-3Torr. A pair of sliding rails are installed at the bottom of the furnace, whichcan be slid manually. Heating and cooling rates up to 100C/m. To achieve fast heating, pre-heat the furnace to a set temperature and then move the furnace to the sample location. To obtain fast cooling, move the stove to the other end after the sample is heated. Heating and cooling rates up to 10C/s under vacuum or inert gas are ideal for rapid heat treatment.
Product Features:
1. Rapid rising and cooling ability
Rapid heating: The slide rail rapid annealing furnace usually uses high-efficiency heating elements such as short- wave infrared radiation heaters or infrared lamps, which can quickly heat up. The heating rate can reach tens of degrees Celsius per second, or even higher, such as the maximum heating rate of some models can reach 50C/s or more.
Rapid cooling: Through the movement of the furnace body on the slide rail, the sample is quickly moved out of the furnace to achieve rapid cooling. The cooling rate is also considerable, which can reach several degrees Celsius per second, depending on the equipment design and experimental conditions.
2. High performance design
High purity insulation materials: the furnace uses high purity alumina polycrystalline fiber and other high efficiency insulation materials, good insulation performance, can reduce heat loss, improve heating efficiency.
Double shell structure: combined with thermal sensing technology and air cooling system, the surface temperature of the furnace body can be cooled quickly, and the safety and stability of the equipment can be improved.
3. Precise temperature control
Intelligent temperature control system: intelligent PID high-precision control, self-tuning function, can achieve multi-stage rise and fall program control, high temperature control accuracy.
Real-time display and monitoring: equipped with man-machine interface and PLC control system, it can display key parameters such as temperature, vacuum degree, gas flow in realtime, which is easy for experimenter to monitor and adjust.
4. Flexibility and expansibility
A variety of heating modes: according to the experimental needs to choose any position heating, left end heating or right end heating and other modes.
Reserved interface and customization service: Reserved vacuum, gas circuit quick interface, according to user needs to customize the furnace size and configuration of the corresponding accessories. At the same time, it supports remote control, real-time tracking, historical records and other functions to improve experiment efficiency.
5. Safety performance
Safe operation function: with power off, overtemperature alarm, leakage protection and other safe operation functions to ensure the safety of personnel and equipment during the experiment.
Air pressure monitoring and protection: real-time monitoring of the pressure in the furnace tube to prevent accidents caused by excessive pressure.
6. Wide application field
Sliding rail rapid annealing furnace is widely used in medical and health, environmental protection, food, chemical and semiconductor manufacturing and other fields to meet the needs of different industries for rapid heat treatment of materials.
Buy Information :
If you are interested in our Slide rail rapid annealing furnace, please contact us for more information and quotation.
• Contact number: +8615617875939
• Email: gordon@zztainuo.com
• Contact: Gordon Zhang
• Wechat: 15617875939
• WhatsApp: +8613592553141
Technical parameters:
Product name | Intelligent sliding type rapid annealing furnace |
Conventional type | CY-T1200-50IT-MRTP (Furnace tube diameter: 50mm) |
CY-T1200-60IT-MRTP (Furnace tube diameter: 60mm) |
CY-T1200-80IT-MRTP (furnace tube diameter: 80mm) |
CY-T1200-100IT-MRTP (furnace tube diameter: 100mm) |
Furnace pattern | Integrated |
Extreme temperature | 1200 ℃ |
Heating rate | ≤20 。C (Recommended :10 。C /min) |
Heat the warm zone | Single temperature zone |
Length of warm zone | 440mm |
Constant temperature zone length | 260mm |
Furnace tube optional | Quartz tube, corundum tube |
Furnace tube length | 1000mm |
Air tightness | 4.03 x 10-3 pa |
Control mode | Intelligent PID |
Temperature control accuracy | + / - 1 ℃ |
Temperature measuring element | Type K thermocouple or type B thermocouple can be selected according to the different temperature used |
Electrical Certification | CE Certification |
Power supply | 220V 50Hz |
Machine power | 2.5 KW |
Overall dimensions | 630×470×610 mm |
After sales service | 12 months warranty, lifetime warranty |
Packing form | Plywood wooden packing box |
Random accessories | Quartz furnace tube; Vacuum flange; Furnace tube clogging; O-ring seal; Protective gloves; Crucible furnace hook; Instruction manual; |
Major parts:
Part name | Part description |
Equipment host | Sliding rail tube furnace |
Mechanical pump | One |
A water cooler | One |
Random accessories | A set |
User manual | A copy |
Field of application:
Sliding rail rapid annealing furnace has a wide range of applications, mainly covering the following aspects:
1. Semiconductor manufacturing
In the semiconductor manufacturing process, the slide rail rapid annealing furnace plays a vital role. It is mainly used for:
Packaging process: In the packaging process, the fast annealing furnace can be used for the cutting of the lead and the annealing treatment after assembly to eliminate the stress in the lead and improve the stability and reliability of the package.
CMOS device back-end process: In the back-end process of CMOS devices, the fast annealing furnace can be used to repair the damage and defects generated in the process and enhance the electrical performance of the device.
Film preparation: For wide-band gap semiconductor materials such as GaN, the fast annealing furnace can be used to improve the crystal quality and surface smoothness of the film, thereby improving the photoelectric performance and stability of the film.
Compound semiconductor material treatment: For compound semiconductor materials such as silicon carbide (SiC), rapid annealing is used to repair lattice damage caused by ion implantation and improve the quality and size of crystal growth.
2. Materials science research
In the field of materials science research, sliding rail rapid annealing furnaces also play an important role. It can be used for rapid heat treatment of a variety of materials, such as metals, ceramics, glass, etc., to improve the microstructure of materials and improve the properties of materials.
3. Integrated circuit and optoelectronics field
Integrated circuits: In integrated circuit manufacturing, fast annealing furnaces are used to achieve electroplating optimization of metal electrodes and improve the contact quality of metal and semiconductor materials through annealing/diffusion process.
In the field of optoelectronics: In the manufacturing process of optoelectronic devices (such asleds, lasers, etc.), fast annealing furnaces are also used to improve the performance and stability of devices.
4. Other application fields
Rapid heat treatment (RTP), rapid annealing (RTA), rapid thermal oxidation (RTO), rapid thermal nitriding (RTN) : These processes are used in the production of a variety of chip products, through rapid heat treatment to improve crystal structure and photoelectric properties.
Ion implantation/contact annealing: After the ion implantation process, an annealing treatment is performed using a rapid annealing furnace to restore the lattice structure of the material and improve its properties.
Metal alloying: During the preparation of metal alloys, rapid annealing furnaces can be used to facilitate the diffusion and alloying reactions of metal elements.
In summary, the sliding rail rapid annealing furnace has a wide range of applications in semiconductor manufacturing, materials science research, integrated circuits and optoelectronics fields, as well as many other aspects. Its efficient and precise heating and annealing capabilities provide strong support for the development of these fields.
Application Case "Introduction to the process of annealing Silicon Carbide (SiC) materials with Sliding Rail Rapid annealing Furnace"
The annealing process of silicon carbide (SiC) material mainly includes the following key steps:
1. preliminary preparation
Material preparation: Ensure that the surface of silicon carbide material is clean, no oil, oxide and other impurities. This is usually achieved by chemical cleaning or physical cleaning.
Equipment inspection: Check the operating status of the annealing furnace (such as rapid annealing furnace, laser annealing equipment, etc.) to ensure that the heating element, temperature control system, atmosphere control system, etc., are working properly.
2.charging and atmosphere control
Loading: The silicon carbide material to be annealed is carefully placed in the furnace chamber of the annealing furnace, paying attention to the placement and direction of the material to ensure that the heat can be evenly distributed.
Atmosphere control: According to the requirements of the annealing process, select the appropriate annealing atmosphere (such as inert gas, reducing gas, etc.), and adjust the atmosphere in the furnace chamber to the required state through the atmosphere control system.
3.heating and heat preservation
Heating: start the annealing furnace and gradually increase the temperature in the furnace according to the predetermined temperature curve. The heating rate needs to be determined according to the characteristics of the silicon carbide material and the requirements of the annealing process to avoid excessive thermal stress or cracks in the material.
Heat preservation: When the furnace temperature reaches the set annealing temperature, maintain the temperature for a period of time, so that the internal structure of the silicon carbide material is fully transformed. The length of holding time depends on the thickness of the material, the severity of the lattice defect and the specific requirements of the annealing process.
4. Cooling
Cooling methodselection: according to the requirements of the annealing process, choose the appropriate cooling method. For silicon carbide materials, rapid cooling (such as quenching) may lead to large thermal stress inside the material, so a slower cooling method is usually used (such as cooling with the furnace or slow cooling).
Cooling operation: According to the selected cooling method, the silicon carbide material is cooled. During the cooling process, it is necessary to closely monitor the change of temperature in the furnace to ensure that the cooling process is smooth.
5. the furnace and follow-up treatment
Baking: When the silicon carbide material has cooled to the right temperature, it is removed from the annealing furnace. Take care to avoid mechanical shocks or scratches to the material during the oven process.
Follow-up treatment: Perform follow-up treatment on the annealed silicon carbide material as needed, such as cleaning, inspection, cutting, etc. These processing steps help to further improve the performance of
the material and meet the requirements of subsequent processing or application.
6. Quality inspection and evaluation
Performance testing: the performance of the annealed silicon carbide material is tested, including hardness, toughness, electrical properties and other indicators. These test results will be used to evaluate the effect of the annealing process and the performance of the material.
Process optimization: According to the performance test results and practical application needs, the annealing process is continuously optimized and improved to improve the overall performance and production efficiency of silicon carbide materials.
To sum up, the annealing process of silicon carbide material is a complex and fine process, which requires strict control of the operating parameters and process conditions of each link to ensure that the silicon carbide material with excellent performance is finally obtained.
